Etch Processing Public Forum
This public forum can be used to direct questions to the members of the Etch Processing working group.
Post your question to the Etch Processing Public Forum
What is the best approach to etching II-VI materials such as ZnSe, ZnS, ZnCdSe?
Is there a suggested protocol to follow when opening a chlorine based etch chamber for maintenance?
Should metal hard masks be used in Bosch deep silicon etch systems? Are there any consequences?
When bringing up a new XeF2 system, are there any suggested starting parameters?