This NNCI Technical Working Group has been established to share information about the proven techniques and unique capabilities of the NNCI member sites in the area of photolithography. Our scope includes all mask-based, interference, and direct-write techniques and tools that use photons to form a pattern.
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|Pat Watson||Singh Center for Nanotechnologyfirstname.lastname@example.org|
|Curt McKenna||Micro Nano Technology Center (MNTC)||email@example.com|
|David Jones||Singh Center for Nanotechnologyfirstname.lastname@example.org|
|Garry Bordonaro||Cornell NanoScale Science & Technology Facility (CNF)||email@example.com|
|Gyu Kim||Singh Center for Nanotechnologyfirstname.lastname@example.org|
|Jiong Hua||Nebraska Center for Materials and Nanoscience (NCMN)||email@example.com|
|John Tamelier||Nano3 Cleanroom Facilityfirstname.lastname@example.org|
|Mary Tang||Stanford Nanofabrication Facilityemail@example.com|
|Phil Himmer||Montana Microfabrication Facility (MMF)||firstname.lastname@example.org|
|Rich Tiberio||Stanford Nano Shared Facilitiesemail@example.com|
|Shu Xiang||Nano3 Cleanroom Facilityfirstname.lastname@example.org|
|Tran-Vinh Nguyen||Institute for Electronics and Nanotechnology Micro/Nano Fabrication Facilityemail@example.com|
|Xuekun Lu||Nano3 Cleanroom Facilityfirstname.lastname@example.org|