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NNCI 2019 Etch Symposium

After a very successful 2018 Etch Symposium at Stanford, we are pleased to announce the 2019 NNCI Etch Symposium on December 5-6 at Harvard University.  The theme this year is "Novel Nanoscale Etching of Electronic, Photonic, 2D, and Quantum Based Materials". This year we are again inviting our etch colleagues at universities outside the NNCI to join us in making this a very fruitful exchange of information.  On the first day we will feature updates from NNCI sites and an open technical discussion of any etch equipment or process issues. Our non-NNCI university invitees are welcome to participate in these discussions since they can add valuable insight from their site's perspective. The second day, open to the public, will feature invited and contributed technical talks from etch equipment vendors, academics, and government lab scientists. Both days will feature an exhibitor area where equipment suppliers can meet with attendees and display their latest offerings in etch technology.

Please mark your calendars and plan to join us in December at Harvard. In the coming months, we will provide additional information on registration, hotels, etc.  Please see the announcement concerning this event.  Feel free to contact any member of the committee with any questions.

The NNCI Etch Symposium Organizing Committee:
Vince Genova-Cornell: (
Ling Xie-Harvard: (
Usha Raghuram-Stanford: (
Sarmita Majumdar-UT Austin: (

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