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EVG 620 UV-NIL

EVG 620 UV-NIL

EVG - EVG 620 UV-NIL

SDNI EVG 620 UV-NIL
SDNI University of California, San Diego Nano3 Cleanroom Facility
  • Patterning
    • All Patterning
      • NIL
Description
The EVG620 UV-NIL System allows for imprint processes on substrates ranging from small wafer pieces to 6" diameter wafers. Uniform contact force for high yield, large area printing is provided by the tool's proprietary chuck design. Soft stamps are used to imprint into UV curable resist, and feature sizes <50nm can be achieved routinely. SDNI also has the capabilities to fabricating master molds for this process.
Maximum Substrate Size
6 inch
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