Working Group News
The 2019 NNCI Etch Symposium, "Novel Nanoscale Etching of Electronic, Photonic, and Quantum Materials", was held at Harvard University, Dec. 6, 2019. Invited speakers included Prof. Federico Capasso (Harvard), Prof. Evelyn Hu (Harvard), Prof. Max Shulaker (MIT), and Dr. Mian Zhang (CEO, Hyperlight, Co.).
Based on input from the last NNCI Etch Symposium in December 2020 and recent input from all the sites, an updated NNCI Etch Capabilities listing is available for download.
Due to COVID-19 travel restrictions, the working group held a virtual workshop via Zoom on December 9, 2020. The workshop was very well attended with 35 participants from within and outside of NNCI. The workshop was dedicated to the important topic of chamber conditions and how these conditions can directly affect etch process outcomes such as rate, selectivity, uniformity, and run-to-run consistency. Presentations on various etch processes and associated chamber conditions were given by technical staff from Cornell, Harvard, and Stanford.
Based on input from the last NNCI Etch Symposium in December 2019 and recent input from all the sites, an updated NNCI Etch Capabilities listing is available for download.
After a very successful 2018 Etch Symposium at Stanford, we are pleased to announce the 2019 NNCI Etch Symposium on December 5-6 at Harvard University. The theme this year is "Novel Nanoscale Etching of Electronic, Photonic, 2D, and Quantum Based Materials".
NNCI Etch Working Group Members*
V. Genova (Genova@cnf.cornell.edu)
NNCI Etch Workshop (October 2018 at Stanford University)
The 2018 NNCI Etch Symposium will be held at Stanford on October 10-11, organized by Usha Raghuram (Stanford) and Ling Xie (Harvard). The primary objective is to collectively assemble etch personnel from the NNCI sites so that we can create an interactive forum where we can share our knowledge of etch equipment and processes.
NNCI and non-NNCI members are invited to the 2018 Etch Symposium, Oct. 10-11, 2018 at Stanford University.